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AR-P 3100 Series Adhesion-enhanced Positive Resists– MSE Supplies LLC

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AR-P 3100 Series Adhesion-enhanced Positive Resists for the Production of Masks and Fine Scale Divisions, 100mL/bottle - MSE Supplies LLC

AR-P 3100 Series Adhesion-enhanced Positive Resists for the Production of Masks and Fine Scale Divisions, 100mL/bottle

SKU: CM8106

  • $ 99995



AR-P 3100 Series Adhesion-enhanced Positive Resists for the Production of Masks and Fine Scale Divisions, 100mL/bottle

Photoresists are in particular used in microelectronics and microsystems technologies for the fabrication of µm- and sub-µm structures. 

Features:

  • Broadband UV, i-line, g-line
  • High photosensitivity, high resolution
  • Strong adhesion to critical glass/chromium surfaces for extreme stresses during wet-chemical etching processes
  • For the production of CD masters and lattice structures
  • AR-P 3170 also suitable for laser interference lithography
  • Plasma etching resistant
  • Combination of novolac and naphthoquinone diazide
  • Safer Solvent PGMEA

Specifications:

SKU# CM8105 CM8106 CM8107
Type AR-P 3110 AR-P 3120 AR-P 3170
Film thickness/4000rpm 1000nm
550nm
120nm
Resolution 0.5um 0.4um 0.5um
Contrast 3
Flash point 46℃
Package size 100mL/bottle

Note: Store at 10-18℃. Available package size: 100mL, 250mL, 1L. CM8105 available upon request.