MSE PRO 1200°C Chemical Vapor Deposition (CVD) System

MSE supplies offers a variety of CVD systems for lab research use. Multiple modules can be combined freely and can be expanded and upgraded. Applicable for a variety of classical chemical vapor deposition processes. Please contact us for customization. 

1200°C CVD System (non-sliding)

1200°C Sliding double temperature zone CVD System

1200°C preheating sliding double temperature zone CVD System

Manufacturer: MSE Supplies LLC

CVD system is applicable for a variety of classical chemical vapor deposition processes, such as 2D material preparation, graphene growth, Transition Metal Dichalcogenides (TMDs) preparation, molybdenum disulfide preparation, thin film material preparation, metal coating, carbon nanotube growth, ZnO nanostructure growth, new crystal materials, ceramic fibers, ceramic capacitor atmosphere sintering, powder material atmosphere sintering, amorphous alloys, etc.

Main Features

• PID programming technology, with temperature accuracy of ±1℃, linear heating, simple operation
• Open design of the furnace body is convenient to confirm the position and state of the sample
• Patented fast stainless steel connecting flange structure, easy to operate
• Air cooling system for sample area fast cooling
• Can be configured to measure the temperature in the tube (optional)
• Sliding system: manual/automatic sliding
• Limited sliding distance, no collision after sliding
• Medium vacuum control system, automatic controlling vacuum pressure
• High vacuum control system, using impact-resistant molecular pump
• Gas flow control system adopts one-way valve technology to prevent gas backflow, and is equipped with a gas mixing tank device