MSE PRO Hafnium Oxide Sputtering Target HfO₂

Hafnium Oxide (HfO₂) Sputtering Target Features

• Purity: 99.95%
• Shape: Discs, Rectangle, Rods, Pellets, Irregular, Custom-Made
• Dimensions:
• Discs: Dia(360mm), Thickness(0.5mm)
• Rectangle: Length(600mm), Width(350mm), Thickness(0.5mm)
• Rods: Dia(360mm), Length(600mm)
• Pellets: Dia(360mm), Thickness(0.5mm)

Hafnium Oxide (HfO₂) Evaporation Material

• Density--- 9.68-9.90 g/cm³
• Solubility---Insoluble in water
• Purity---99.99%
• Melting point--- 2758 C
• Linear expansion coefficient---5. x 10^-6/K
• Properties of thin film
• Transmission range: 220 - 12000nm
• Refractive index at 250nm: 2.15, at 500nm: 2
• Hints on evaporation

1. Evaporation with electron-beam gun.
2. Oxygen partial pressure 1 x 10^-2 Pa
3. Evaporation temperature 2600 ~ 2800°C
4. Substrate temperature 250°C
5. Rate of deposition 2 nm/s
6. Evaporate with low energy density

• Shape---Solid substance, White or grey tablets, Powder
• Application ---Anti-reflection coatings, interference coatings for the UV.