MSE PRO Mechanical Exfoliation Monolayer Tungsten Disulfide (WS₂) Film on SiO₂/Si

MSE PRO™ Mechanical Exfoliation Monolayer Tungsten Disulfide (WS₂) Film on SiO₂/Si

• Film: Monolayer Tungsten Disulfide (WS₂)
• SiO₂/Si with 90nm SiO₂ (SU5019)
• WS₂ size: >20um
  
• Substrate size: 10x10mm
• Each sample contains at least one single-layer WS₂

Applications

Monolayer tungsten disulfide (WS₂) is a two-dimensional direct band gap semiconductor with unique mechanical, electronic, optical, and chemical properties that can be utilized for novel nanoelectronics and optoelectronics devices.

Tungsten disulfide (WS₂) prepared through mechanical exfoliation has lower defect rates and superior optical characteristics. This material allows for research on layer counts and fluorescence effects, making it an ideal choice for device fabrication due to its preserved crystal lattice structure.

We can offer monolayer, multilayer WS₂ film and Isolated WS₂ flakes on  substrates, such as sapphire, Si, Si/SiO₂, quartz etc. Please contact MSE Supplies if you need bulk pricing or customization.

References

[1] Victor Carozo, Yuanxi Wang, et al. Optical identification of sulfur vacancies: Bound excitons at the edges of monolayer tungsten disulfide.Sci. Adv.3,e1602813(2017).

[2] Molas, Maciej R., Nogajewski, Karol, Slobodeniuk, Artur O., et al. The optical response of monolayer, few-layer and bulk tungsten disulfide, The Royal Society of Chemistry, Nanoscale, 9 (35), 2017, 13128-13141.