Tungsten Titanium Sputtering Target WTi

SKU: TA4281

To better serve you, we would like to discuss your specific requirement.
Please Contact Us for a quote.

Specifications for Tungsten Titanium Sputtering Target

Product Name	Tungsten titanium sputtering target WTi
Purity	99.99% 4N, 99.999% 5N
Impurity content	<0.01%
Grain Size	<100 um
Shape	Ingot Sputtering Targets Disk Plate Sheet Foil Wire According to your request
Available size	Round: dia 25~400mm Rectangular: length up to 1500mm Customization is available
Application	Widely used in coating processing industries such as optical data storage application and film coating.
Advantage	High purity low content of impurities Better heat dissipation High hard texture High tensile strength
Certificates	ISO9001:2008 SGS, the third test report