List of High Purity Sputtering Targets
Chemical Composition List for Sputtering Targets
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High Purity Alloy Sputtering Targets
Nickel-Chromium (Ni-Cr) |
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Nickel-Iron (Ni-Fe) |
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Nickel-Titanium (Ni-Ti) |
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Giant Magnetostrictive Material, GMM |
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Copper Indium (CuIn) |
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Iron Boron (Fe-B) |
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Oxide Ceramic Sputtering Targets
Neodymium Oxide (Nd2O3) |
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Nd(0.67)Ba(0.33)Mn(1)O(3) (NBMO) |
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Silicon Monoxide(SiO) |
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Europium Oxide (Eu2O3) |
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Titanium Oxide (Ti2O3) |
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Titanium Oxide (Ti3O5) |
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Tungsten Oxide (WO2.9) |
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Iron Oxide (Fe3O4) |
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La(0.67)Ba(0.33)Mn(1)O(3) (LBMO) |
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La0.67Sr0.33MnO3 (LSMO) |
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IZO (Indium Zinc Oxide, 90 wt% In2O3 / 10 wt% ZnO) |
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Lead Zirconate Titanate (Pb[Zr(x)Ti(1-x)]O3) (PZT) |
ZrO2 Doped with Titanium (Ti-ZrO2) |
Silica Doped Zirconia (ZrO2 + SiO2) |
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Lutetium Oxide (Lu2O3) |
ZrO2 -Y2O3 stabilized (YSZ) |
Nitride Ceramic Sputtering Targets
Titanium Carbo-Nitride (TiCN) |
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Carbide Ceramic Sputtering Targets
Titanium Carbo-Nitride (TiCN) |
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Tungsten Carbide (W2C) |
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Tungsten Carbide Doped with Nickel (Ni-WC) |
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Niobium Nitride (NbC) |
Tungsten Carbide Doped with Cobalt (Co-WC) |
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Fluoride Ceramic Sputtering Targets
Magnesium Fluoride (MgF2) |
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Cerium Fluoride (CeF3) | |
Cryolite (Na3AlF6) |
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Hafnium Fluoride (HfF4) | |
Silicide Ceramic Sputtering Targets
Tantalum Silicide (Ta5Si3) |
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Chromium Silicide (Cr2Si) |
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Titanium Silicide(Ti5Si3) |
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Molybdenum Silicide(Mo5Si3) |
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vanadium Silicide (V3Si) |
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Niobium Silicide(NbSi2) |
Sulfide Ceramic Sputtering Targets
Boride Ceramic Sputtering Targets
Chromium Boride (Cr2B) |
Neodymium Diboride (NdB2) |
Chromium Boride (CrB) |
Tantalum Diboride (TaB2) |
Tungsten Diboride (WB2) |
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Vanadium Diboride (VB2) |
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Molybdenum Boride (Mo2B5) |
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Selenide Ceramic Sputtering Targets
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