Name
|
Sign
|
Purity
|
Character
|
Chromium Silicide
|
Cr3Si
|
99.99%, 99.5%
|
Sputtering Target, Evaporation Material, Substrate, Granule, Discs, Plates, Sheets, Circle, Powders(40-300mesh)
|
Chromium Silicide
|
CrSi2
|
99.99%, 99.5%
|
Sputtering Target, Evaporation Material, Substrate, Granule, Discs, Plates, Sheets, Circle, Powders(40-300mesh)
|
Hafnium Silicide
|
HfSi2
|
99.99%, 99.5%
|
Sputtering Target, Evaporation Material, Substrate, Granule, Discs, Plates, Sheets, Circle, Powders(40-300mesh)
|
Magnesium Silicide
|
Mg2Si
|
99.99%,99.999%
|
Powder, lump, chunk
|
Molybdenum Silicon
|
MoSi2
|
99.99%, 99.5%
|
Sputtering Target, Evaporation Material, Substrate, Granule, Discs, Plates, Sheets, Circle, Powders(40-300mesh)
|
Niobium Silicide
|
NbSi2
|
99.99%, 99.5%
|
Sputtering Target, Evaporation Material, Substrate, Granule, Discs, Plates, Sheets, Circle, Powders(40-300mesh)
|
Silicon Carbide
|
SiC
|
99.99%, 99.5%
|
Sputtering Target, Granule, Discs, Plates, Sheets, Circle, Pellet, Nanometer Powder, Powders(40-300mesh)
|
Silicon Dioxide
|
SiO2
|
99.99%, 99.5%
|
Sputtering Target, Evaporation Material, Substrate, Wafer, Granule, Discs, Plates, Sheets, Circle, Pellet
|
Silicon Monoxide
|
SiO
|
99.99%, 99.5%
|
Sputtering Target, Evaporation Material, Granule, Discs, Plates, Sheets, Circle, Pellet
|
Silicon Nitride
|
Si3N4
|
99.99%, 99.5%
|
Sputtering Target, Evaporation Material, Granule, Discs, Plates, Sheets, Pellet, Nanometer Powder, Powders(40-300mesh)
|
Tantalum Silicide
|
TaSi2
|
99.99%, 99.5%
|
Sputtering Target, Evaporation Material, Substrate, Granule, Discs, Plates, Sheets, Circle, Powders(40-300mesh)
|
Tantalum Silicide
|
Ta5Si3
|
99.99%, 99.5%
|
Sputtering Target, Evaporation Material, Substrate, Granule, Discs, Plates, Sheets, Circle, Powders(40-300mesh)
|
Titanium Silicide
|
TiSi2
|
99.99%, 99.5%
|
Sputtering Target, Evaporation Material, Substrate, Granule, Discs, Plates, Sheets, Circle, Powders(40-300mesh)
|
Titanium Silicide
|
Ti5Si3
|
99.99%, 99.5%
|
Sputtering Target, Evaporation Material, Substrate, Granule, Discs, Plates, Sheets, Circle, Powders(40-300mesh)
|
Tungsten Silicide
|
WSi2
|
99.99%, 99.5%
|
Sputtering Target, Evaporation Material, Substrate, Granule, Discs, Plates, Sheets, Circle, Powders(40-300mesh)
|
Vanadium Silicide
|
V3Si
|
99.5%
|
Sputtering Target, Evaporation Material, Substrate, Granule, Discs, Plates, Sheets, Circle, Powders(40-300mesh)
|
Vanadium Silicide
|
VSi2
|
99.5%
|
Sputtering Target, Evaporation Material, Substrate, Granule, Discs, Plates, Sheets, Circle, Powders(40-300mesh)
|
Zirconium Silicon
|
ZrSi2
|
99.9%
|
Sputtering Target, Evaporation Material, Substrate, Granule, Discs, Plates, Sheets, Circle, Powders
|
|