Thermal Oxide Silicon Wafer – Si/SiO2 wafer

Thermal Oxide Silicon Wafer – Si/SiO2 wafer

Overview

Silicon wafer (4″-dia.) coated with wet thermal oxide (silicon dioxide, SiO2, 285-nm thick)

Description

• Wet Thermal Oxide (Silicon Dioxide, SiO2) on Both Sides
• Oxide Thickness: 285-nm +/- 5%
• Type: P
• Dopant: Boron
• Polishing: Single-side (SSP)
• Grade: Prime
• Dimensions: 100-mm diameter
• Thickness: 525 +/- 25 μm
• Resistivity: ≤ 0.005 ohm-cm
• Orientation: <100>
• SEMI flats: 2

Please contact us for bulk order or customized shape, size, thickness and substrate.

MSE Supplies offers custom metal coating services using e-beam vapor deposition, a high-vacuum process with excellent control of film thickness.

MSE Supplies offers a wide selection of high-quality evaporation materials and crucibles in a full range of purity and dimensions for thin film coatings. These materials are suitable for all commercial evaporation systems, whether your requirements are for thermal evaporation or electron beam deposition system.