Thermal Oxide Wafer Coated with Gold

Thermal Oxide Wafer Coated with Gold

Overview

Substrate: Prime Grade Thermal oxide silicon Wafer (100-mm dia., 525-µm thick)

Oxide Thickness: 285-nm +/- 5%

Metal Layer: Gold, 50-nm

Gold Purity: 99.999%

Adhesion Layer: Titanium, 2.5-nm

Quantity: One (1) gold-coated thermal oxide silicon wafer

Description

Ideal for fabrication for sensors, biosensors and electrodes via photolithography and wet etching techniques.

Please contact us for bulk order or customized shape, size, thickness and substrate.

MSE Supplies offers custom metal coating services using e-beam vapor deposition, a high-vacuum process with excellent control of film thickness.

MSE Supplies offers a wide selection of high-quality evaporation materials and crucibles in a full range of purity and dimensions for thin film coatings. These materials are suitable for all commercial evaporation systems, whether your requirements are for thermal evaporation or electron beam deposition system.