The Standard ETCH Cell

The Standard ETCH Cell

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One of the most common applications of an electrochemical etching cell is the preparation of a Nanocrystalline Porous Silicon Layer on a single crystal Si wafer.

Application note

To perform an electrochemical process, a square conducting sample is placed on the cell base, using a piece of aluminum foil as a back contact. The setup is sealed by an O-ring to prevent electrolyte leakage. The cell is filled with an electrolyte, and the wire electrode is immersed in the solution as a counter electrode. An electric current is passed between the aluminum back contact and the wire electrode for a certain amount of time. After the process, the cell elements should be washed several times with ethanol and dried under the nitrogen flow. 

Specification

Nominal exposure area: 1.20 cm²
Electrolyte volume: 4.8 mL
Minimum sample size: 20 mm x 20 mm
Maximum sample width: 31 mm

Product Includes

1 x cell base - 0058CPEMASM
1 x cell top - 0060CPEMASM
1 x set of screws - 0057PNYCM

Setup Includes

The Standard ETCH Cell - Peek,  PTFE
Spiral Wire Electrode - 50Sp17 0.6/191 mm, Platinum (99,9%)