Features of our coating process include:
- Aluminum purity: 99.999%
- Electron-beam deposition
- Low deposition rate -> High quality film
- Pre-cleaned substrates (plasma or base bath)
- Titanium adhesion layer (optional)
- Dedicated cleanroom fabrication environment
Availability
SKU# | Substrate Form | Substrate Size | Film Thickness (nm) | Pieces/Pack |
AL.1000.SL0 | Silicon Wafer | Φ100x0.525 mm | 100 | 1 |