AR-P 5350 Sensitive Resists for the Production of Vapour Deposition Patterns by Lift-off, 100mL/bottle

AR-P 5350 Sensitive Resists for the Production of Vapour Deposition Patterns by Lift-off, 100mL/bottle

Photoresists are in particular used in microelectronics and microsystems technologies for the fabrication of µm- and sub-µm structures. AR-P 5350 is a sensitive resists for the production of vapour deposition patterns by lift-off. 

Features:

• Broadband UV, i-line, g-line
• High photosensitivity, high resolution
• Good adhesion properties
• For undercut structures for the production of evaporation samples, in particular of metal using lift-off techniques e.g. for conductor paths
• Plasma etching resistant, temperature stable up to 120 °C
• Combination of novolac and naphthoquinone diazide
• Safer Solvent PGMEA

Specifications:

Note: Store at 10-18℃. Available package size: 100mL, 250mL, 1L.